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Browse full water treatment spare parts at Shuitianlan(STL): ultrapure resin series, filtration membrane products, various filter vessels, branded EDI modules, multiple types of UV sterilizers and original imported water pumps for industrial water purification.
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Shuitianlan(STL) is a professional water treatment consumables distributor focusing on membrane, resin, filter, EDI and disinfection products. With stable supply chain and rich project experience, we serve global water engineering companies with cost-effective products & technical support.
Shuitianlan(STL) matches targeted consumable supporting schemes for petrochemical wastewater recycling, food & beverage production pure water, municipal drinking water purification, helping enterprises reduce water treatment operation cost.
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The importance of ultrapure water used in the semiconductor, OLED, LCD,
and other electronics industries is increasing, and as related industries advance,
the purity and reliability standards for ultrapure water are becoming even stricter.
TRILITE® ion exchange resins for ultrapure water have been delivered domestically and internationally to ultrapure water facilities in the semiconductor, display (OLED, LCD) industries, and have acquired references of trust. They are contributing to improving our customers' competitiveness through stable quality control and timely delivery. TRILITE® ion exchange resins for ultrapure water are divided into URR100, UPR200, UPR300, and UPR400 series depending on the required ultrapure water quality.
TRILITE® ion exchange resins for ultrapure water feature
TRILITE® ion exchange resins for ultrapure water have a very high level of uniformity coefficient (less than 1.1) to achieve high operational exchange capacity even at high flow rates.
To minimize ion leakage, it has very high H and OH conversion rates.
Strict management is maintained to control total organic carbon (TOC) and trace metal ion leakage.
| Product Name | Outlet condition | Features and Application |
| UPRM100U | Guarantee) Resistivity > 17.0㏁∙cm | General electronics |
| Actual) Resistivity > 18.0㏁∙cm | Demineralization, Final polisher | |
| UPRM200U | Resistivity > 18.1㏁∙cm(in 30 min) | Display Demineralization, |
| △TOC < 5 ppb (in 120min) | Final polisher | |
| UPRM300U | Resistivity > 18.2㏁∙cm(in 30 min) | Display, |
| △TOC < 1 ppb (in 180min) | Semiconductor grade Final polisher | |
| UPRM400U | Resistivity > 18.2㏁∙cm(in 30 min) | Semiconductor grade |
| △TOC < 1 ppb (in 180min) | Final polisher | |
| Metal impurity (ppm, as Dry Base) | ||
| Na<1, Fe<1, Zn<0.5, Al<0.5 | ||
| UPHR1 | Resistivity > 18.2㏁∙cm(in 24hr) | Removal of organic contaminants in |
| △TOC < 1 ppb (in 24hr) | semiconductors | |
| CLR-B3UP | Resistivity > 17.0㏁∙cm(in 48hr) | Ultrapure Water boron removal |
| △TOC < 5 ppb (in 48hr) |
